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Difference between revisions of "EEF"
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* Filters modelisation - 90% | * Filters modelisation - 90% | ||
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* EMF Databinding integration - 5% | * EMF Databinding integration - 5% | ||
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* New advanced widgets set (Nebula, Riena, ...) - 0% | * New advanced widgets set (Nebula, Riena, ...) - 0% | ||
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== Contact == | == Contact == | ||
Revision as of 12:27, 9 November 2009
Contents
Presentation
The EEF project is part of EMFT (EMF Technology).
EEF provides a generative component and runtime infrastructure for developing advanced components to ease the EMF based model editing. It is composed of three parts :
- A runtime containing a set of advanced widgets and a generic and extensible MVC architecture
- Standard metamodels allowing the definition of models that will parameterize the actual editing components that are to be generated
- An Acceleo module generating a standard architecture extending the framework's runtime.
The generated elements can be integrated in any SWT/JFace components to ease the EMF model based editing.
Documentation
Installation
Tutorials
Guides
Sources
Roadmap
v0.7.1
- Views refactoring (control part extraction) - 90%
- Views composition - 100%
- SWT Standard widgets management - 75%
- Extension point to add generator - 100%
- Better context management - 0%
- EEF widgets features alignement - 80%
v0.8.0
- Alternative EMF.Edit generation - 0%
- Filters modelisation - 90%
- Incremental intializer - 0%
- EMF Databinding integration - 5%
- Help system integration - 5%
- Lock system - 0%
- Test generation - 10%
v1.0
- New advanced widgets set (Nebula, Riena, ...) - 0%
Contact
Team
- Goulwen Le Fur, Obeo - Project lead
- Nathalie Lépine, Obeo
- Stéphane Bouchet, Obeo
- Patrick Tessier, CEA List - UML codegen maintainer
More information
- Newsgroup : eclipse.technology.emft
- Mailing list : emft-dev@eclipse.org