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Difference between revisions of "EEF"

(Extended Editing Framework - EEF)
(Presentation)
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== Presentation ==
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== Presentation ==
  
The EEF project is part of EMFT (EMF Technology).
+
The EEF project is part of EMFT (EMF Technology).  
  
EEF provides a generative component and runtime infrastructure for developing advanced components to ease the EMF based model editing. It is composed of three parts :
+
EEF provides a generative component and runtime infrastructure for developing advanced components to ease the EMF based model editing. It is composed of three parts :  
  
* A runtime containing a set of advanced widgets and a generic and extensible MVC architecture
+
*A runtime containing a set of advanced widgets and a generic and extensible MVC architecture  
* Standard metamodels allowing the definition of models that will parameterize the actual editing components that are to be generated
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*Standard metamodels allowing the definition of models that will parameterize the actual editing components that are to be generated  
* A [[Acceleo]] module generating a standard architecture extending the framework's runtime.
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*An [[Acceleo]] module generating a standard architecture extending the framework's runtime.
  
The generated elements can be integrated in any SWT/JFace components to ease the EMF model based editing.
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The generated elements can be integrated in any SWT/JFace components to ease the EMF model based editing.  
  
 +
== Roadmap  ==
  
 +
=== v0.7.1  ===
  
[[Category:Modeling]]
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* Views refactoring (control part extraction) - 90%
[[Category:EMFT]]
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* Views composition - 100%
 +
* SWT Standard widgets management - 75%
 +
* Extension point to add generator - 100%
 +
* Better context management - 0%
 +
* EEF widgets features alignement - 80%
 +
 
 +
=== v0.7.2  ===
 +
 
 +
* Alternative EMF.Edit generation - 0%
 +
* Filters modelisation - 90%
 +
 
 +
=== v0.8.0 ===
 +
 
 +
* Incremental intializer - 0%
 +
* EMF Databinding integration - 5%
 +
* Help system integration - 5%
 +
* Lock system - 0%
 +
* Test generation - 10%
 +
 
 +
=== v1.0 ===
 +
* New advanced widgets set (Nebula, Riena, ...) - 0%
 +
 
 +
[[Category:Modeling]] [[Category:EMFT]]

Revision as of 12:50, 12 August 2009

Presentation

The EEF project is part of EMFT (EMF Technology).

EEF provides a generative component and runtime infrastructure for developing advanced components to ease the EMF based model editing. It is composed of three parts :

  • A runtime containing a set of advanced widgets and a generic and extensible MVC architecture
  • Standard metamodels allowing the definition of models that will parameterize the actual editing components that are to be generated
  • An Acceleo module generating a standard architecture extending the framework's runtime.

The generated elements can be integrated in any SWT/JFace components to ease the EMF model based editing.

Roadmap

v0.7.1

  • Views refactoring (control part extraction) - 90%
  • Views composition - 100%
  • SWT Standard widgets management - 75%
  • Extension point to add generator - 100%
  • Better context management - 0%
  • EEF widgets features alignement - 80%

v0.7.2

  • Alternative EMF.Edit generation - 0%
  • Filters modelisation - 90%

v0.8.0

  • Incremental intializer - 0%
  • EMF Databinding integration - 5%
  • Help system integration - 5%
  • Lock system - 0%
  • Test generation - 10%

v1.0

  • New advanced widgets set (Nebula, Riena, ...) - 0%